Biometrics for Art

ArtMetrics at ICCV

Honolulu (Hawaii), October 19th-20th, 2025

Description

The Biometrics for Arts (ArtMetrics) workshop aims to explore the intersection of biometrics, computer vision and the arts to provide a more nuanced understanding of an artwork's provenance and maker(s). In the same way as Biometrics serves as a tool for person identification from unique phenotypic or behavioural traits, Biometrics for Arts aims at artist recognition from unique attributes detected on works of art, thus fostering dialogue between engineers, computer scientists, heritage scientists, conservators, and art historians. This workshop will showcase innovative applications of computer vision in the visual art domain, emphasizing the role of technology in supporting conservation practices and enhancing the management of museum and private collections. Key topics include pattern recognition in works of art, AI-driven artistic generation, AI-driven analysis of multimodal imaging data of works of art, and digital restoration of different media. ArtMetrics seeks to inspire interdisciplinary collaboration, highlighting how computer vision can both interpret and enhance the diverse world of art.

Call for Papers

We invite submissions of extended abstracts to the ArtMetrics @ICCV2025 workshop, which aims to explore the intersection of biometrics, computer vision, and the arts to provide a more nuanced understanding of an artwork's provenance and creator(s).

Topics of Interest:

This workshop welcomes original research contributions showcasing innovative applications of computer vision in art analysis, creation, preservation, and interactive experiences.

Key topics include:
  • Visual recognition and classification of works of art
  • Face, fingerprint, toolmark recognition on works of art
  • AI-driven artistic generation and style transfer
  • AI-driven analysis of multimodal imaging data of works of art
  • Digital restoration and preservation of artworks
  • Computational analysis of art history and visual culture

All accepted extended abstracts will be presented as posters. They will not be included in the proceedings of the conference.

Submission Guidelines:
Registration:

You need a full passport registration to attend the workshop and present your work.

Important Dates

Extended abstract submission deadline
August 20th, 2025 July 31st, 2025
Notification of Submission Acceptance
August 27th, 2025 August 20th, 2025
ArtMetrics@ICCV2025
October 19th-20th, 2025

Submission Deadline:

0
days
0
hours
0
minutes
0
seconds

Keynotes

Luuk Spreeuwers is a leading figure in European biometrics and associate professor at the University of Twente with over 20 years of experience. His recent research explores biometric tools in cultural heritage, such as automatic face recognition of Roman Emperors and the project on Borobudur Temple Compounds (funded by the NWO (Dutch Research Council)).

Rick Johnson has focused his recent research on the field of computational art history. Among others, he has held positions at the Cornell University, Van Gogh Museum, Rijksmuseum, and RKD - Nederlands Instituut voor Kunstgeschiedenis. He is currently a PhD student in Art History at the Vrije Universiteit Amsterdam (VU Amsterdam).

Panel Session

The panel discussion will feature:

  • Data Imaging Scientists: Researchers who apply advanced imaging acquisition setups and/or computer vision tools for art investigation. The panelists: Luuk Spreeuwers, Rick Johnson, and Sébastien Marcel. Prof. Marcel heads the Biometrics Security and Privacy group at the Idiap Research Institute. He is Professor at the University of Lausanne, lecturer at the EPFL, and the Director of the Swiss Center for Biometrics Research and Testing.
  • An Art History Focus: An art historian sharing real-world applications of computer vision in the art domain. The panelist: Lia Costiner is Assistant Professor in the Digital Art History at Utrecht University, focusing on late-medieval and early-modern visual culture and digital methodologies. This year, she was NWIB Visiting Professor at the Netherlands Interuniversity Institute for Art History in Florence.
  • A glimpse Into The Art Marketplace: An expert explores authenticity in the art marketplace, including proofs of provenance for physical and digital works, and how AI enhances creativity while protecting originality. The panelist: Sixtine Crutchfield is the Director of WISe.ART, the platform for entrusted NFT powered by WISeKey SA, a company specialized in cyber security. Sixtine's experience in the art sector ranges, among others, from her employment at the Jan Krugier Gallery, to creating an Art Advisory desk for Banque Edouard Constant and designing the Geneva Business School Art Management Masters programme.

Schedule

TimeEvent
1:00 pm – 1:10 pmIntroduction
1:10 pm – 2:00 pmInvited speaker 1: prof. dr. ir. Luuk Spreeuwers
(Data Management and Biometrics group, University of Twente, NL)
2:00 pm – 2:15 pmCoffee break
2:15 pm – 3:00 pmInvited speaker 2: Prof. dr. ir. Rick Johnson
(Fellow in Computational Arts and Humanities at the Jacobs Technion-Cornell Institute, USA)
3:00 pm – 3:15 pmCoffee break
3:15 pm – 4:15 pmPanel session
4:15 pm – 5:15 pmPoster session
5:15 pm – 5:30 pmClosing remarks
1:00 pm – 1:10 pm

Introduction

1:10 pm – 2:00 pm

Invited speaker 1: prof. dr. ir. Luuk Spreeuwers

(Data Management and Biometrics group, University of Twente, NL)

2:00 pm – 2:15 pm

Coffee break

2:15 pm – 3:00 pm

Invited speaker 2: Prof. dr. ir. Rick Johnson

(Fellow in Computational Arts and Humanities at the Jacobs Technion-Cornell Institute, USA)

3:00 pm – 3:15 pm

Coffee break

3:15 pm – 4:15 pm

Panel session

4:15 pm – 5:15 pm

Poster session

5:15 pm – 5:30 pm

Closing remarks

Organisers

Dzemila Sero
Dzemila Sero

University of Twente

Estefania Talavera
Estefania Talavera

University of Twente

Tugce Arican
Tugce Arican

University of Twente

Katrien Keune
Katrien Keune

University of Amsterdam & Rijksmuseum

John Delaney
John Delaney

National Gallery of Art

Karen Trentelman
Karen Trentelman

Getty Conservation Institute

Robert van Langh
Robert van Langh

Rijksmuseum, NICAS

Location

The workshop is located in

Hawaii Convention Center
1801 Kalākaua Ave, Honolulu,
HI 96815, United States

Media Sponsors

Contact us at artmetrics-board@googlegroups.com if you are interested in sponsoring ArtMetrics.

Logo

© 2025 - ArtMetrics @ICCV2025 workshop