The Biometrics for Arts (ArtMetrics) workshop aims to explore the intersection of biometrics, computer vision and the arts to provide a more nuanced understanding of an artwork's provenance and maker(s). In the same way as Biometrics serves as a tool for person identification from unique phenotypic or behavioural traits, Biometrics for Arts aims at artist recognition from unique attributes detected on works of art, thus fostering dialogue between engineers, computer scientists, heritage scientists, conservators, and art historians. This workshop will showcase innovative applications of computer vision in the visual art domain, emphasizing the role of technology in supporting conservation practices and enhancing the management of museum and private collections. Key topics include pattern recognition in works of art, AI-driven artistic generation, AI-driven analysis of multimodal imaging data of works of art, and digital restoration of different media. ArtMetrics seeks to inspire interdisciplinary collaboration, highlighting how computer vision can both interpret and enhance the diverse world of art.
Biometrics for Art
ArtMetrics at ICCV
Honolulu (Hawaii), October 19th-20th, 2025
Description
Call for Papers
We invite submissions of extended abstracts to the ArtMetrics @ICCV2025 workshop, which aims to explore the intersection of biometrics, computer vision, and the arts to provide a more nuanced understanding of an artwork's provenance and creator(s).
Topics of Interest:
This workshop welcomes original research contributions showcasing innovative applications of computer vision in art analysis, creation, preservation, and interactive experiences.
Key topics include:
- Visual recognition and classification of works of art
- Face, fingerprint, toolmark recognition on works of art
- AI-driven artistic generation and style transfer
- AI-driven analysis of multimodal imaging data of works of art
- Digital restoration and preservation of artworks
- Computational analysis of art history and visual culture
All accepted extended abstracts will be presented as posters. They will not be included in the proceedings of the conference.
Submission Guidelines:
- Papers should be formatted according to the IEEE Conference Proceedings template.
- Submissions must be in PDF format and should not exceed 3 pages, not including references.
- Paper should be submitted via this link: ICCV 2025 Workshop ArtMetrics | OpenReview.
Registration:
You need a full passport registration to attend the workshop and present your work.
Keynotes
The Role of Facial Hair on Roman Emperors’ Face Recognition and other applications of biometrics in Art and History.
Luuk Spreeuwers is a leading figure in European biometrics and associate professor at the University of Twente with over 20 years of experience. His recent research explores biometric tools in cultural heritage, such as automatic face recognition of Roman Emperors and the project on Borobudur Temple Compounds (funded by the NWO (Dutch Research Council)).
Computational Art Connoisseurship: Getting Started.
Rick Johnson has focused his recent research on the field of computational art history. Among others, he has held positions at the Cornell University, Van Gogh Museum, Rijksmuseum, and RKD - Nederlands Instituut voor Kunstgeschiedenis. He is currently a PhD student in Art History at the Vrije Universiteit Amsterdam (VU Amsterdam).
Panel Session
The panel discussion will feature:
- Data Imaging Scientists: Researchers who apply advanced imaging acquisition setups and/or computer vision tools for art investigation. The panelists: Luuk Spreeuwers, Rick Johnson, and Sébastien Marcel. Prof. Marcel heads the Biometrics Security and Privacy group at the Idiap Research Institute. He is Professor at the University of Lausanne, lecturer at the EPFL, and the Director of the Swiss Center for Biometrics Research and Testing.
- An Art History Focus: An art historian sharing real-world applications of computer vision in the art domain. The panelist: Lia Costiner is Assistant Professor in the Digital Art History at Utrecht University, focusing on late-medieval and early-modern visual culture and digital methodologies. This year, she was NWIB Visiting Professor at the Netherlands Interuniversity Institute for Art History in Florence.
- A glimpse Into The Art Marketplace: An expert explores authenticity in the art marketplace, including proofs of provenance for physical and digital works, and how AI enhances creativity while protecting originality. The panelist: Sixtine Crutchfield is the Director of WISe.ART, the platform for entrusted NFT powered by WISeKey SA, a company specialized in cyber security. Sixtine's experience in the art sector ranges, among others, from her employment at the Jan Krugier Gallery, to creating an Art Advisory desk for Banque Edouard Constant and designing the Geneva Business School Art Management Masters programme.
Pictures
Schedule
| Time | Event |
|---|---|
| 1:00 pm – 1:10 pm | Introduction |
| 1:10 pm – 2:00 pm | Invited speaker 1: prof. dr. ir. Luuk Spreeuwers (Data Management and Biometrics group, University of Twente, NL) |
| 2:00 pm – 2:15 pm | Coffee break |
| 2:15 pm – 3:00 pm | Invited speaker 2: Prof. dr. ir. Rick Johnson (Fellow in Computational Arts and Humanities at the Jacobs Technion-Cornell Institute, USA) |
| 3:00 pm – 3:15 pm | Coffee break |
| 3:15 pm – 4:15 pm | Panel session |
| 4:15 pm – 5:15 pm | Poster session |
| 5:15 pm – 5:30 pm | Closing remarks |
1:00 pm – 1:10 pm
Introduction
1:10 pm – 2:00 pm
Invited speaker 1: prof. dr. ir. Luuk Spreeuwers
(Data Management and Biometrics group, University of Twente, NL)
2:00 pm – 2:15 pm
Coffee break
2:15 pm – 3:00 pm
Invited speaker 2: Prof. dr. ir. Rick Johnson
(Fellow in Computational Arts and Humanities at the Jacobs Technion-Cornell Institute, USA)
3:00 pm – 3:15 pm
Coffee break
3:15 pm – 4:15 pm
Panel session
4:15 pm – 5:15 pm
Poster session
5:15 pm – 5:30 pm
Closing remarks
List of Accepted Abstract
- ArtFace: Towards Historical Portrait Face Identification via Model Adaptation
Francois Poh (1), Anjith George (2), Sebastien Marcel (2)
(1) Imperial College London, Exhibition Rd, South Kensington, SW7 2AZ London, United Kingdom
(2) Idiap Research Institute Rue Marconi 19, CH - 1920 Martigny, Switzerland
- Reflectance imaging spectroscopy (RIS) for the study of large-format Rembrandt paintings at the Rijksmuseum: challenges and achievements.
F. Gabrieli (1), J.K. Delaney (2), P. Noble (1), K. Keune (1,3) and Operation Night Watch team
(1) Conservation and Science Department, Rijksmuseum, Hobbemastraat 22, 1017 ZC Amsterdam, The Netherlands
(2) Scientific Research Department, National Gallery of Art, 6th and Constitution Avenue NW, Washington, DC 20565, USA
(3) Van’t Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1090 GD Amsterdam, The Netherlands
- Brushstrokes as Biometrics: Artist Attribution via Deep Stroke Fingerprinting
Bayron Jossue Serrano Mena
Ciudad Universitaria Rodrigo Facio Brenes, San José, San Pedro, Costa Rica
- From Clay to Code: Patch-based Enhancement of Historic Fingerprint Impressions
Tugce Arican (1), Isabelle Garachon (2), Bodill Lamain (2), Bieke van der Mark (3), Dzemila Sero (1)
(1) Data Management and Biometrics, Hallenweg 19, University of Twente, 7522 NH Enschede, The Netherlands
(2) Conservation and Science Department, Rijksmuseum, Hobbemastraat 22, 1017 ZC Amsterdam, The Netherlands
(3) Fine Arts Department, Rijksmuseum, Hobbemastraat 22, 1071 ZC Amsterdam, The Netherlands
- Provenance Analysis of Archaeological Artifacts via Multimodal RAG Systems
Tuo Zhang (1), Yuechun Sun (1), Ruiliang Liu (2)
(1) University of Science and Technology of China, JinZhai Road Baohe District, Hefei, Anhui, 230026, P.R.China
(2) British Museum, Great Russell St, WC1B 3DG London, United Kingdom
- Face and Object Recognition for the Study of Historical Portraiture
Matthies Klink (1), Lisa Bunda (1), Sebastian Bunda (2), Ilja Kaniscev (2), Ferdinand de Jong (2), Estefanía Talavera Talaveria (2), Dzemila Sero (2), Lisandra S. Costiner (1)
(1) Utrecht University, Heidelberglaan 8, 3584 CS Utrecht, The Netherlands
(2) Data Management and Biometrics, Hallenweg 19, University of Twente, 7522 NH Enschede, The Netherlands
Location
The workshop is located in
Hawaii Convention Center
1801 Kalākaua Ave, Honolulu,
HI 96815, United States
Media Sponsors
Contact us at artmetrics-board@googlegroups.com if you are interested in sponsoring ArtMetrics.
